Hard X-ray one dimensional nano-focusing at the SSRF using a WSi2/Si multilayer Laue lens

The multilayer Laue lens （MLL） is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first deposit...

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Published in中国物理C：英文版 no. 2; pp. 98 - 101
Main Author 黄秋实 李浩川 宋竹青 朱京涛 王占山 李爱国 闫帅 毛成文 王华 闫芬 张玲 余笑赛 刘鹏 李明
Format Journal Article
LanguageEnglish
Published 01.02.2013
Subjects
SSRF
一维
劳厄
对焦
硬X射线
纳米尺度
衍射光学元件
镜头
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Summary:The multilayer Laue lens （MLL） is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current （DC） magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35–41 μm. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility （SSRF）. One-dimensional （1D） focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.
Bibliography:HUANG Qiu-Shi, LI Hao-Chuan, SONG Zhu-Qing, ZHU Jing-Tao ,WANG Zhan-Shan, LI Ai-Guo, YAN Shuai, MAO Cheng-Wen,WANG Hua,YAN Fen, ZHANG Ling,YU Xiao-Han,LIU Peng, LI Ming（1 Key Laboratory of Advanced Micro-structured Materials, MOE, Institute of Precision Optical Engineering Department of Physics, Tongji University, Shanghai 200092, China 2 Shanghai Synchrotron Radiation Facility, Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201204, China 3 Beijing Synchrotron Radiation Facility, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China ）
11-5641/O4
nano-focusing, hard X-ray, multilayer Laue lens, synchrotron radiation, diffraction
The multilayer Laue lens （MLL） is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current （DC） magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35–41 μm. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility （SSRF）. One-dimensional （1D） focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.
ISSN:1674-1137
0254-3052
DOI:10.1088/1674-1137/37/2/028002