Novel Process of Simultaneous Removal of Nitric Oxide and Sulfur Dioxide Using a Vacuum Ultraviolet (VUV)-Activated O 2 /H 2 O/H 2 O 2 System in A Wet VUV-Spraying Reactor
A novel process for NO and SO simultaneous removal using a vacuum ultraviolet (VUV, with 185 nm wavelength)-activated O /H O/H O system in a wet VUV-spraying reactor was developed. The influence of different process variables on NO and SO removal was evaluated. Active species (O and ·OH) and liquid...
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Published in | Environmental science & technology Vol. 50; no. 23; pp. 12966 - 12975 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
United States
06.12.2016
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Subjects | |
Online Access | Get full text |
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Summary: | A novel process for NO and SO
simultaneous removal using a vacuum ultraviolet (VUV, with 185 nm wavelength)-activated O
/H
O/H
O
system in a wet VUV-spraying reactor was developed. The influence of different process variables on NO and SO
removal was evaluated. Active species (O
and ·OH) and liquid products (SO
, NO
, SO
, and NO
) were analyzed. The chemistry and routes of NO and SO
removal were investigated. The oxidation removal system exhibits excellent simultaneous removal capacity for NO and SO
, and a maximum removal of 96.8% for NO and complete SO
removal were obtained under optimized conditions. SO
reaches 100% removal efficiency under most of test conditions. NO removal is obviously affected by several process variables. Increasing VUV power, H
O
concentration, solution pH, liquid-to-gas ratio, and O
concentration greatly enhances NO removal. Increasing NO and SO
concentration obviously reduces NO removal. Temperature has a dual impact on NO removal, which has an optimal temperature of 318 K. Sulfuric acid and nitric acid are the main removal products of NO and SO
. NO removals by oxidation of O
, O·, and ·OH are the primary routes. NO removals by H
O
oxidation and VUV photolysis are the complementary routes. A potential scaled-up removal process was also proposed initially. |
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ISSN: | 0013-936X 1520-5851 |
DOI: | 10.1021/acs.est.6b02753 |