Characterization of Deposition Process, Microstructure and Interfacial States of Silicon Dioxide Film Using Tetraethylorthosilicate/O[sub 2] with Various Dilution Gases

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Bibliographic Details
Published inJournal of the Electrochemical Society Vol. 148; no. 10; p. C679
Main Authors Yi, Chung, Kim, Hyo Uk, Rhee, Shi Woo
Format Journal Article
LanguageEnglish
Published 2001
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ISSN:0013-4651
DOI:10.1149/1.1401086