Erratum: Effect of selected atomic layer deposition parameters on the structure and dielectric properties of hafnium oxide films [J. Appl. Phys. 96, 5298 (2004)]

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Bibliographic Details
Published inJournal of applied physics Vol. 97; no. 9
Main Authors Kukli, Kaupo, Aarik, Jaan, Ritala, Mikko, Uustare, Teet, Sajavaara, Timo, Lu, Jun, Sundqvist, Jonas, Aidla, Aleks, Pung, Lembit, Hårsta, Anders, Leskelä, Markku
Format Journal Article
LanguageEnglish
Published 01.05.2005
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Bibliography:correction
ISSN:0021-8979
1089-7550
DOI:10.1063/1.1895475