Electrical Characterization and Materials Stability Analysis of / Composite Oxides on n- MOS Capacitors With Different Annealing Temperatures
In this letter, a high-k composite oxide composed of La 2 O 3 and HfO 2 is investigated for n-In 0.53 Ga 0.47 As metal-oxide-semiconductor (MOS) capacitor application. The composite oxide was formed by depositing five layers of La 2 O 3 (0.8 nm)/HfO 2 (0.8 nm) on InGaAs with post deposition annealin...
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Published in | IEEE electron device letters Vol. 34; no. 10; pp. 1229 - 1231 |
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Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
IEEE
01.10.2013
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Abstract | In this letter, a high-k composite oxide composed of La 2 O 3 and HfO 2 is investigated for n-In 0.53 Ga 0.47 As metal-oxide-semiconductor (MOS) capacitor application. The composite oxide was formed by depositing five layers of La 2 O 3 (0.8 nm)/HfO 2 (0.8 nm) on InGaAs with post deposition annealing at 500°C. The MOS capacitors fabricated show good inversion behavior, high capacitance, low leakage current, with excellent interface trap density (D it ) of 7.0×10 11 cm -2 eV -1 , small hysteresis of 200 mV and low capacitance equivalent thickness of 2.2 nm at 1 kHz were also achieved. |
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AbstractList | In this letter, a high-k composite oxide composed of La 2 O 3 and HfO 2 is investigated for n-In 0.53 Ga 0.47 As metal-oxide-semiconductor (MOS) capacitor application. The composite oxide was formed by depositing five layers of La 2 O 3 (0.8 nm)/HfO 2 (0.8 nm) on InGaAs with post deposition annealing at 500°C. The MOS capacitors fabricated show good inversion behavior, high capacitance, low leakage current, with excellent interface trap density (D it ) of 7.0×10 11 cm -2 eV -1 , small hysteresis of 200 mV and low capacitance equivalent thickness of 2.2 nm at 1 kHz were also achieved. |
Author | Diaz, Carlos H. Yueh Chin Lin Ting Wei Chuang Iwai, Hiroshi Ahmet, Parhat Hai Dang Trinh Chang, Edward Yi Kakushima, Kuniyuki Jang, Simon M. Hui Chen Chang Chun Hsiung Lin |
Author_xml | – sequence: 1 surname: Yueh Chin Lin fullname: Yueh Chin Lin email: nctulin@yahoo.com.tw organization: Dept. of Mater. Sci. & Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan – sequence: 2 surname: Hai Dang Trinh fullname: Hai Dang Trinh organization: Dept. of Mater. Sci. & Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan – sequence: 3 surname: Ting Wei Chuang fullname: Ting Wei Chuang organization: Dept. of Mater. Sci. & Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan – sequence: 4 givenname: Hiroshi surname: Iwai fullname: Iwai, Hiroshi organization: Dept. of Electron. & Appl. Phys., Tokyo Inst. of Technol., Yokohama, Japan – sequence: 5 givenname: Kuniyuki surname: Kakushima fullname: Kakushima, Kuniyuki organization: Dept. of Electron. & Appl. Phys., Tokyo Inst. of Technol., Yokohama, Japan – sequence: 6 givenname: Parhat surname: Ahmet fullname: Ahmet, Parhat organization: Dept. of Electron. & Appl. Phys., Tokyo Inst. of Technol., Yokohama, Japan – sequence: 7 surname: Chun Hsiung Lin fullname: Chun Hsiung Lin organization: Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan – sequence: 8 givenname: Carlos H. surname: Diaz fullname: Diaz, Carlos H. organization: Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan – sequence: 9 surname: Hui Chen Chang fullname: Hui Chen Chang organization: Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan – sequence: 10 givenname: Simon M. surname: Jang fullname: Jang, Simon M. organization: Taiwan Semicond. Manuf. Co., Hsinchu, Taiwan – sequence: 11 givenname: Edward Yi surname: Chang fullname: Chang, Edward Yi organization: Dept. of Mater. Sci. & Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan |
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References | ref13 weber (ref1) 2011; 109 ref12 o'connor (ref9) 2009; 94 trinh (ref14) 2010; 97 ref2 ref8 filatova (ref4) 2006 ref7 xuan (ref10) 2007 ref3 ref6 ref5 zhu (ref11) 2008 |
References_xml | – ident: ref3 doi: 10.1143/APEX.5.021104 – volume: 109 start-page: 33715-1 year: 2011 ident: ref1 article-title: Native defects in <formula formulatype="inline"><tex Notation="TeX">${\rm Al}_{2}{\rm O}_{3}$</tex></formula> and their impact on III-V/<formula formulatype="inline"><tex Notation="TeX">${\rm Al}_{2}{\rm O}_{3}$</tex></formula> metal-oxidesemiconductor-based devices publication-title: J Appl Phys doi: 10.1063/1.3544310 contributor: fullname: weber – volume: 94 start-page: 102902-1 year: 2009 ident: ref9 article-title: Temperature and frequency dependent electrical characterization of <formula formulatype="inline"> <tex Notation="TeX">${\rm HfO}_{2}/{\rm In}_{x}{\rm Ga}_{1-x}{\rm As}$</tex></formula> interfaces using capacitance-voltage and conductance methods publication-title: Appl Phys Lett contributor: fullname: o'connor – ident: ref13 doi: 10.1063/1.3698095 – ident: ref7 doi: 10.1149/1.1577545 – ident: ref2 doi: 10.1063/1.2363959 – start-page: 100 year: 2008 ident: ref11 article-title: Charge trapping and wearout characteristics of self-aligned enhancement-mode GaAs n-MOSFET with Si interface passivation layer and <formula formulatype="inline"><tex Notation="TeX">${\rm HfO}_{2}$</tex></formula> gate oxide publication-title: Proc IEEE CSIC Symp contributor: fullname: zhu – ident: ref8 doi: 10.1149/1.3569932 – ident: ref12 doi: 10.1063/1.2883967 – start-page: 637 year: 2007 ident: ref10 article-title: High performance submicron inversion-type enhancement-mode InGaAs MOSFETs with ALD <formula formulatype="inline"><tex Notation="TeX">${\rm Al}_{2}{\rm O}_{3}$</tex></formula>, <formula formulatype="inline"><tex Notation="TeX">${\rm HfO}_{2}$</tex></formula> and HfAlO as gate dielectrics publication-title: Proc IEEE IEDM contributor: fullname: xuan – start-page: 359 year: 2006 ident: ref4 article-title: X-ray reflection and emission spectroscopic analysis of <formula formulatype="inline"><tex Notation="TeX">${\rm Al}_{2}{\rm O}_{3}$</tex></formula>/Si and <formula formulatype="inline"><tex Notation="TeX">${\rm HfO}_{2}/{\rm SiO}_{2}$</tex> </formula>/Si structure publication-title: Proc SRMS-5 Conf contributor: fullname: filatova – volume: 97 start-page: 42903-1 year: 2010 ident: ref14 article-title: The influences of surface treatment and gas annealing conditions on the inversion behaviors of the atomic-layer-deposition <formula formulatype="inline"><tex Notation="TeX">${\rm Al}_{2}{\rm O}_{3}$</tex></formula>/n-<formula formulatype="inline"><tex Notation="TeX">${\rm In}_{0.53}{\rm Ga}_{0.47}{\rm As}$</tex></formula> metal-oxide-semiconductor capacitor publication-title: Appl Phys Lett doi: 10.1063/1.3467813 contributor: fullname: trinh – ident: ref6 doi: 10.3390/ma5081413 – ident: ref5 doi: 10.1063/1.1650874 |
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Snippet | In this letter, a high-k composite oxide composed of La 2 O 3 and HfO 2 is investigated for n-In 0.53 Ga 0.47 As metal-oxide-semiconductor (MOS) capacitor... |
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SubjectTerms | Aluminum oxide Annealing Hafnium compounds InGaAs Leakage currents Logic gates Materials metal-oxide-semi-conductor (MOS) molecular beam deposition (MBD) MOS capacitors post deposition annealing (PDA) {\rm HfO}_{2} {\rm La}_{2}{\rm O}_{3} |
Title | Electrical Characterization and Materials Stability Analysis of / Composite Oxides on n- MOS Capacitors With Different Annealing Temperatures |
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