Room-Temperature Patterning of Nanoscale MoS 2 under an Electron Beam

• Published in: ACS applied materials & interfaces Vol. 12; no. 14; pp. 16772 - 16781
• Main Authors: Saifullah, Mohammad S M, Asbahi, Mohamed, Binti-Kamran Kiyani, Maryam, Liow, Sing Shy, Bin Dolmanan, Surani, Yong, Anna Marie, Ong, Esther A H, Ibn Saifullah, Asadullah, Tan, Hui Ru, Dwivedi, Neeraj, Dutta, Tanmay, Ganesan, Ramakrishnan, Valiyaveettil, Suresh, Chong, Karen S L, Tripathy, Sudhiranjan
• Format: Journal Article
• Language: English
• Published: United States 08.04.2020
• Subjects: single-source precursors; nanofabrication; xanthates; molybdenum disulfide; electron beam lithography; resists; molybdenum thiocubane

Molybdenum disulfide (MoS ) is traditionally grown at a high temperature and subsequently patterned to study its electronic properties or make devices. This method imposes severe limitations on the shape and size of MoS crystals that can be patterned precisely at required positions. Here, we describ...