Effect of post annealing on properties of N-doped TiO 2 films deposited by reactive magnetron sputtering

Abstract The paper studies the effect of annealing on the structure and properties of N-doped TiO 2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces...

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Bibliographic Details
Published inJournal of physics. Conference series Vol. 1281; no. 1; p. 12083
Main Authors Sun, Zhilei, Evdokimov, K E, Konishchev, M E, Kuzmin, O S, Pichugin, V F
Format Journal Article
LanguageEnglish
Published 01.07.2019
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Summary:Abstract The paper studies the effect of annealing on the structure and properties of N-doped TiO 2 films, deposited by reactive magnetron sputtering. An increase in the annealing temperature results in a reduction of the film thickness and a rise of the refractive index. The post annealing induces the anatase-rutile phase transition and also leads to band gap narrowing and wettability transition.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/1281/1/012083