Near-Infrared Polarization-Sensitive Detection by All-Si Plasmonic Hot Electron Detectors

Polarization-sensitive optoelectronic detection has been achieved by an all-Si detector in the NIR range, based on plasmon hot electron generation/internal photoemission effect. An advanced architecture with a specially designed anisotropic metasurface was developed and structurally optimized for ma...

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Published inNano letters
Main Authors Tian, Shuoqiu, Yuan, Wentao, Yu, Yu, Guo, Jinyu, Liu, Kangping, Tong, Xujie, Chen, Qiucheng, Wu, Qingxin, Quan, Hao, Zhou, Jing, Chen, Yifang
Format Journal Article
LanguageEnglish
Published United States 09.10.2024
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Summary:Polarization-sensitive optoelectronic detection has been achieved by an all-Si detector in the NIR range, based on plasmon hot electron generation/internal photoemission effect. An advanced architecture with a specially designed anisotropic metasurface was developed and structurally optimized for maximizing the internal quantum efficiency (IQE). Assisted by finite difference time domain (FDTD) simulations, the well-designed device exhibits a maximum optical absorption of 80% around 1.45 μm, corresponding to an optical discrimination ratio of 120. Optoelectronic measurements show the peak responsivity and detectivity of 51.2 mA/W and 8.05 × 10 cm Hz /W, respectively, at 1.45 μm. A high polarization photocurrent ratio of 35 nm is also achieved at 1.55 μm. Moreover, the optoelectronic response can be tuned by a back-gate bias. Last but not least, we built up a model for theoretically estimating the IQE, which provides instructive guidance for further enhancing the optoelectronic performance of hot electron detectors.
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ISSN:1530-6984
1530-6992
1530-6992
DOI:10.1021/acs.nanolett.4c03959