Regimes of leakage current in ALD-processed Al 2 O 3 thin-film layers

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Bibliographic Details
Published inJournal of physics. D, Applied physics Vol. 46; no. 15; p. 155302
Main Authors Spahr, Holger, Reinker, Johannes, Bülow, Tim, Nanova, Diana, Johannes, Hans-Hermann, Kowalsky, Wolfgang
Format Journal Article
LanguageEnglish
Published 17.04.2013
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ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/46/15/155302