Orientation selective epitaxial growth of CeO 2 layers on Si(1 0 0) substrates using reactive DC magnetron sputtering with substrate bias
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Published in | Journal of crystal growth Vol. 271; no. 1-2; pp. 176 - 183 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
01.10.2004
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Online Access | Get full text |
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Author | Shida, Shigenari Ohashi, Masayuki Inoue, Tomoyasu Sakamoto, Naomichi |
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Cites_doi | 10.1063/1.1526169 10.1063/1.347442 10.1103/PhysRevLett.53.2331 10.1063/1.103202 10.1063/1.101908 10.1143/JJAP.32.1765 10.1557/mrs2002.71 10.1116/1.1626644 10.1557/PROC-341-107 10.1063/1.1356451 10.1063/1.105646 10.1557/PROC-474-333 10.1143/JJAP.33.270 10.1143/JJAP.29.L1199 10.1063/1.1461059 10.1143/JJAP.34.L688 10.1016/0022-0248(93)90184-X 10.1063/1.1351849 10.1557/PROC-474-321 10.1557/PROC-341-101 10.1063/1.115362 |
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