Orientation selective epitaxial growth of CeO 2 layers on Si(1 0 0) substrates using reactive DC magnetron sputtering with substrate bias

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Bibliographic Details
Published inJournal of crystal growth Vol. 271; no. 1-2; pp. 176 - 183
Main Authors Inoue, Tomoyasu, Ohashi, Masayuki, Sakamoto, Naomichi, Shida, Shigenari
Format Journal Article
LanguageEnglish
Published 01.10.2004
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ISSN:0022-0248
DOI:10.1016/j.jcrysgro.2004.07.052