HfO 2 /Al 2 O 3 multilayer for RRAM arrays: a technique to improve tail-bit retention

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Bibliographic Details
Published inNanotechnology Vol. 27; no. 39; p. 395201
Main Authors Huang, Xueyao, Wu, Huaqiang, Bin Gao, Sekar, Deepak C, Dai, Lingjun, Kellam, Mark, Bronner, Gary, Deng, Ning, Qian, He
Format Journal Article
LanguageEnglish
Published 30.09.2016
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ISSN:0957-4484
1361-6528
DOI:10.1088/0957-4484/27/39/395201