Pore formation in p-type silicon in solutions containing different types of alcohol

• Published in: Nanoscale research letters Vol. 7; no. 1; p. 329
• Main Authors: Urata, Tomoko, Fukami, Kazuhiro, Sakka, Tetsuo, Ogata, Yukio H
• Format: Journal Article
• Language: English
• Published: New York Springer New York 21.06.2012; BioMed Central Ltd; Springer
• Subjects: Chemistry and Materials Science; Materials Science; Molecular Medicine; Nano Express; Nanochemistry; Nanoscale Science and Technology; Nanotechnology; Nanotechnology and Microengineering; Porous Semiconductors - Science and Technology 2012; Porous Layer; Pore Wall; Porous Silicon; Hydrogen Fluoride; Et2O
• ISSN: 1556-276X; 1931-7573; 1556-276X
• DOI: 10.1186/1556-276X-7-329

Macroporous structure of silicon can be obtained with anodization in hydrogen fluoride (HF) solution. The macropore formation in the presence of alcohol was studied. Macroporous layer formation in a low-concentration HF solution is stabilized with the increasing number of carbon in alcohol. The dissolution at the topmost part of the porous layer is observed though the behavior depends upon the type of alcohol. Meanwhile, the total mass loss of dissolved silicon is almost constant. Such dissolution at the top surface occurs only when the concentration of HF is low. Adding organic solvents to the HF solution also leads to the suppression of the pore wall dissolution. The type of alcohol and HF concentration in solution affect the formation of porous silicon.