Characterization of epitaxial GaAs MOS capacitors using atomic layer-deposited TiO2/Al2O3 gate stack: study of Ge auto-doping and p-type Zn doping
Electrical and physical properties of a metal-oxide-semiconductor [MOS] structure using atomic layer-deposited high- k dielectrics (TiO 2 /Al 2 O 3 ) and epitaxial GaAs [epi-GaAs] grown on Ge(100) substrates have been investigated. The epi-GaAs, either undoped or Zn-doped, was grown using metal-orga...
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Published in | Nanoscale research letters Vol. 7; no. 1; p. 99 |
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Main Authors | , , , , , , , , , , , |
Format | Journal Article |
Language | English |
Published |
New York
Springer New York
02.02.2012
BioMed Central Ltd Springer |
Subjects | |
Online Access | Get full text |
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Summary: | Electrical and physical properties of a metal-oxide-semiconductor [MOS] structure using atomic layer-deposited high-
k
dielectrics (TiO
2
/Al
2
O
3
) and epitaxial GaAs [epi-GaAs] grown on Ge(100) substrates have been investigated. The epi-GaAs, either undoped or Zn-doped, was grown using metal-organic chemical vapor deposition method at 620°C to 650°C. The diffusion of Ge atoms into epi-GaAs resulted in auto-doping, and therefore, an n-MOS behavior was observed for undoped and Zn-doped epi-GaAs with the doping concentration up to approximately 10
17
cm
-3
. This is attributed to the diffusion of a significant amount of Ge atoms from the Ge substrate as confirmed by the simulation using SILVACO software and also from the secondary ion mass spectrometry analyses. The Zn-doped epi-GaAs with a doping concentration of approximately 10
18
cm
-3
converts the epi-GaAs layer into p-type since the Zn doping is relatively higher than the out-diffused Ge concentration. The capacitance-voltage characteristics show similar frequency dispersion and leakage current for n-type and p-type epi-GaAs layers with very low hysteresis voltage (approximately 10 mV).
PACS:
81.15.Gh. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1556-276X 1931-7573 1556-276X |
DOI: | 10.1186/1556-276X-7-99 |