Impact of TCO Microstructure on the Electronic Properties of Carbazole-based Self-Assembled Monolayers

Carbazole-based self-assembled monolayers (PACz-SAMs), anchored via their phosphonic acid group on a transparent conductive oxide (TCO) have demonstrated excellent performance as hole-selective layers in inverted perovskite solar cells. However, the influence of the TCO microstructure on the work fu...

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Bibliographic Details
Published inarXiv.org
Main Authors Kralj, Suzana, Dally, Pia, Bampoulis, Pantelis, Badri Vishal, De Wolf, Stefaan, Morales-Masis, Monica
Format Paper Journal Article
LanguageEnglish
Published Ithaca Cornell University Library, arXiv.org 17.09.2023
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Summary:Carbazole-based self-assembled monolayers (PACz-SAMs), anchored via their phosphonic acid group on a transparent conductive oxide (TCO) have demonstrated excellent performance as hole-selective layers in inverted perovskite solar cells. However, the influence of the TCO microstructure on the work function (WF) shift after SAM anchoring as well as the WF variations at the micro/nanoscale have not been extensively studied yet. Herein, we investigate the effect of the Sn-doped In2O3 (ITO) microstructure on the WF distribution upon 2PACz-SAMs and NiOx/2PACz-SAMs application. For this, ITO substrates with amorphous and polycrystalline (featuring either nanoscale or microscale-sized grains) microstructures are studied. A correlation between the ITO grain orientation and 2PACz-SAMs local potential distribution was found via Kelvin probe force microscopy and electron backscatter diffraction. These variations vanish for amorphous ITO or when adding an amorphous NiOx buffer layer, where a homogeneous surface potential distribution is mapped. Ultraviolet photoelectron spectroscopy confirmed the ITO WF increase after 2PACz-SAMs deposition. Considering the importance of polycrystalline TCOs as high mobility and broadband transparent electrodes, we provide insights to ensure uniform WF distribution upon application of hole transport SAMs, which is critical towards enhanced device performance.
ISSN:2331-8422
DOI:10.48550/arxiv.2309.03573