All-optical GeV electron bunch generation in a laser-plasma accelerator via truncated-channel injection
We describe a simple scheme, truncated-channel injection, to inject electrons directly into the wakefield driven by a drive pulse guided by an all-optical plasma channel. We use this approach to generate dark-current-free 1.2 GeV, 4.5 % relative energy spread electron bunches with 120 TW laser pulse...
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Main Authors | , , , , , , , , , , , , |
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Format | Journal Article |
Language | English |
Published |
25.07.2023
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Subjects | |
Online Access | Get full text |
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Summary: | We describe a simple scheme, truncated-channel injection, to inject electrons
directly into the wakefield driven by a drive pulse guided by an all-optical
plasma channel. We use this approach to generate dark-current-free 1.2 GeV, 4.5
% relative energy spread electron bunches with 120 TW laser pulses guided in a
110-mm-long hydrodynamic optical-field-ionized (HOFI) plasma channel. Our
experiments and particle-in-cell simulations show that high-quality electron
bunches were only obtained when the drive pulse was closely aligned with the
channel axis, and was focused close to the density down-ramp formed at the
channel entrance. Start-to-end simulations of the channel formation, and
electron injection and acceleration show that increasing the channel length to
410 mm would yield 3.65 GeV bunches, with a slice energy spread $\sim 5 \times
10^{-4}$. |
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DOI: | 10.48550/arxiv.2307.13689 |