On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge
Time-resolved Langmuir probe diagnostics at the discharge centerline and at three distances from the target (35mm, 60mm, and 100mm) was carried out during long positive voltage pulses (a duration of 500$\mu$s and a preset positive voltage of 100V) in bipolar High-Power Impulse Magnetron Sputtering o...
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Main Authors | , , , |
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Format | Journal Article |
Language | English |
Published |
27.03.2024
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Subjects | |
Online Access | Get full text |
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Summary: | Time-resolved Langmuir probe diagnostics at the discharge centerline and at
three distances from the target (35mm, 60mm, and 100mm) was carried out during
long positive voltage pulses (a duration of 500$\mu$s and a preset positive
voltage of 100V) in bipolar High-Power Impulse Magnetron Sputtering of a Ti
target (a diameter of 100mm) using an unbalanced magnetron. Fast-camera
spectroscopy imaging recorded light emission from Ar and Ti atoms and singly
charged ions during positive voltage pulses. It was found that during the long
positive voltage pulse, the floating and the plasma potentials suddenly
decrease, which is accompanied by the presence of anode light located on the
discharge centerline between the target center and the magnetic null of the
magnetron's magnetic field. These light patterns are related to the ignition of
a reverse discharge, which leads to the subsequent rise in the plasma and the
floating potentials. The reversed discharge is burning up to the end of the
positive voltage pulse, but the plasma and floating potentials have lower
values than the values from the initial part of the positive voltage pulse.
Secondary electron emission induced by the impinging Ar$^+$ ions to the
grounded surfaces in the vicinity of the discharge plasma together with the
mirror configuration of the magnetron magnetic field are identified as the
probable causes of the charge double-layer structure formation in front of the
target and the ignition of the reverse discharge. |
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DOI: | 10.48550/arxiv.2403.18598 |