Suspending superconducting qubits by silicon micromachining

We present a method for relieving aluminum 3D transmon qubits from a silicon substrate using micromachining. Our technique is a high yield, one-step deep reactive ion etch that requires no additional fabrication processes, and results in the suspension of the junction area and edges of the aluminum...

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Bibliographic Details
Published inarXiv.org
Main Authors Chu, Y, Axline, C, Wang, C, Brecht, T, Gao, Y Y, Frunzio, L, Schoelkopf, R J
Format Paper Journal Article
LanguageEnglish
Published Ithaca Cornell University Library, arXiv.org 09.06.2016
Subjects
Aluminum
Micromachining
Physics - Quantum Physics
Physics - Superconductivity
Silicon substrates
Superconducting quantum interference devices
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Summary:We present a method for relieving aluminum 3D transmon qubits from a silicon substrate using micromachining. Our technique is a high yield, one-step deep reactive ion etch that requires no additional fabrication processes, and results in the suspension of the junction area and edges of the aluminum film. The drastic change in the device geometry affects both the dielectric and flux noise environment experienced by the qubit. In particular, the participation ratios of various dielectric interfaces are significantly modified, and suspended qubits exhibited longer \(T_1\)'s than non-suspended ones. We also find that suspension increases the flux noise experienced by tunable SQUID-based qubits.
ISSN:2331-8422
DOI:10.48550/arxiv.1606.02822