Contact resistance assessment and high-frequency performance projection of black phosphorus field-effect transistor technologies

• Published in: arXiv.org
• Main Authors: Valdez-Sandoval, Leslie M, Ramirez-Garcia, Eloy, Jiménez, David, Pacheco-Sanchez, Anibal
• Format: Paper Journal Article
• Language: English
• Published: Ithaca Cornell University Library, arXiv.org 22.10.2020
• Subjects: Contact resistance; Field effect transistors; Phosphorus; Physics - Mesoscale and Nanoscale Physics; Semiconductor devices; Temperature dependence
• ISSN: 2331-8422
• DOI: 10.48550/arxiv.2009.09661

In this work, an evaluation of the contact quality of black phosphorus (BP) field-effect transistors (FETs) from different technologies previously reported is performed by means of an efficient and reliable contact resistance extraction methodology based on individual device practical characteristics. A good agreement is achieved between the extracted values with the Y-function method used here and reference values obtained with other methods considering internal values as well as with more expensive methods involving fabricated test structures. The method enables a direct evaluation of different steps in the same technology and it embraces the temperature dependence of the contact characteristics. Channel phenomena have no impact on the extracted contact resistance values. High-frequency performance projections are obtained for fabricated devices based on the extracted contact resistance.