Quantum spatial superresolution by optical centroid measurements
Quantum lithography (QL) has been suggested as a means of achieving enhanced spatial resolution for optical imaging, but its realization has been held back by the low multi-photon detection rates of recording materials. Recently, an optical centroid measurement (OCM) procedure was proposed as a way...
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Published in | arXiv.org |
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Main Authors | , , , |
Format | Paper Journal Article |
Language | English |
Published |
Ithaca
Cornell University Library, arXiv.org
11.05.2011
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Subjects | |
Online Access | Get full text |
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Summary: | Quantum lithography (QL) has been suggested as a means of achieving enhanced spatial resolution for optical imaging, but its realization has been held back by the low multi-photon detection rates of recording materials. Recently, an optical centroid measurement (OCM) procedure was proposed as a way to obtain spatial resolution enhancement identical to that of QL but with higher detection efficiency (M. Tsang, Phys. Rev. Lett. 102, 253601, 2009). Here we describe a variation of the OCM method with still higher detection efficiency based on the use of photon-number-resolving detection. We also report laboratory results for two-photon interference. We compare these results with those of the standard QL method based on multi-photon detection and show that the new method leads to superresolution but with higher detection efficiency. |
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ISSN: | 2331-8422 |
DOI: | 10.48550/arxiv.1105.2312 |