Speciation of Nickel in a Hyperaccumulating Plant by High-Performance Liquid Chromatography−Inductively Coupled Plasma Mass Spectrometry and Electrospray MS/MS Assisted by Cloning Using Yeast Complementation

A novel analytical approach based on a combination of multidimensional hyphenated techniques and cloning of the Ni-resistance gene using yeast complementation screens was developed for the identification of nickel species in a Thlaspi caerulescens hyperaccumulating plant. The presence of an unknown...

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Published inAnalytical chemistry (Washington) Vol. 75; no. 11; pp. 2740 - 2745
Main Authors Vacchina, Véronique, Mari, Stéphane, Czernic, Pierre, Marquès, Laurence, Pianelli, Katia, Schaumlöffel, Dirk, Lebrun, Michel, Łobiński, Ryszard
Format Journal Article
LanguageEnglish
Published Washington, DC American Chemical Society 01.06.2003
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Summary:A novel analytical approach based on a combination of multidimensional hyphenated techniques and cloning of the Ni-resistance gene using yeast complementation screens was developed for the identification of nickel species in a Thlaspi caerulescens hyperaccumulating plant. The presence of an unknown strong Ni complex was demonstrated by size exclusion HPLC−capillary electrophoresis with ICPMS detection. The Ni-containing peak was characterized by electrospray MS (m/z 360) and shown by collision-induced dissociation MS to be a chelate with a tricarboxylic amino acid ligand. To identify the species and demonstrate its functional character, a cDNA library was constructed from T. caerulescens, expressed in the yeast, and screened on a toxic Ni2+ medium. The extract from the surviving transformant culture gave identical HPLC−ICPMS, CZE−ICPMS, and ES MS/MS data and contained a cDNA insert homologous to the nicotianamine synthase gene. This observation allowed the identification of nicotianamine as the nickel-binding ligand. The presence of the Ni−nicotianamine complex was ultimately demonstrated by comparing tandem mass spectra of the plant and yeast extracts with those of a synthetic standard.
Bibliography:istex:D55F0301A8073EF491B5D132278C450598D29EC0
ark:/67375/TPS-W62JFCW5-6
ISSN:0003-2700
1520-6882
DOI:10.1021/ac020704m