Microanalysis by Laser-Induced Plasma Spectroscopy in the Vacuum Ultraviolet
A new setup for microanalysis by laser-induced plasma spectroscopy in the VUV range is presented and described in detail. The system features an integrated ablation and detection module with a newly designed VUV echelle system. The echelle permits a full spectral coverage between 150 and 300 nm with...
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Published in | Analytical chemistry (Washington) Vol. 76; no. 6; pp. 1648 - 1656 |
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Main Authors | , , , , , |
Format | Journal Article |
Language | English |
Published |
Washington, DC
American Chemical Society
15.03.2004
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Subjects | |
Online Access | Get full text |
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Summary: | A new setup for microanalysis by laser-induced plasma spectroscopy in the VUV range is presented and described in detail. The system features an integrated ablation and detection module with a newly designed VUV echelle system. The echelle permits a full spectral coverage between 150 and 300 nm with a resolving power λ/Δλ between 11 000 and 15 000. At present, the ablation module permits a microanalysis with a crater size of 25 μm and a nominal depth resolution with an ablation rate of 150 nm/pulse. The VUV performance was demonstrated for bulk analysis of steel; detection limits for sulfur, carbon, and phosphorus were in the lower milligram per kilogram range. The VUV scanning and mapping performance for heterogeneous matrixes was illustrated for mineral bottom ash samples from a waste incineration process. |
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Bibliography: | istex:EDB5986DED353C66133778DC49394FA46478A76A ark:/67375/TPS-Q9CKG5C1-W ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0003-2700 1520-6882 |
DOI: | 10.1021/ac0351365 |