An Atomically Layered InSe Avalanche Photodetector

Atomically thin photodetectors based on 2D materials have attracted great interest due to their potential as highly energy-efficient integrated devices. However, photoinduced carrier generation in these media is relatively poor due to low optical absorption, limiting device performance. Current meth...

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Bibliographic Details
Published inNano letters Vol. 15; no. 5; pp. 3048 - 3055
Main Authors Lei, Sidong, Wen, Fangfang, Ge, Liehui, Najmaei, Sina, George, Antony, Gong, Yongji, Gao, Weilu, Jin, Zehua, Li, Bo, Lou, Jun, Kono, Junichiro, Vajtai, Robert, Ajayan, Pulickel, Halas, Naomi J
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 13.05.2015
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Summary:Atomically thin photodetectors based on 2D materials have attracted great interest due to their potential as highly energy-efficient integrated devices. However, photoinduced carrier generation in these media is relatively poor due to low optical absorption, limiting device performance. Current methods for overcoming this problem, such as reducing contact resistances or back gating, tend to increase dark current and suffer slow response times. Here, we realize the avalanche effect in a 2D material-based photodetector and show that avalanche multiplication can greatly enhance the device response of an ultrathin InSe-based photodetector. This is achieved by exploiting the large Schottky barrier formed between InSe and Al electrodes, enabling the application of a large bias voltage. Plasmonic enhancement of the photosensitivity, achieved by patterning arrays of Al nanodisks onto the InSe layer, further improves device efficiency. With an external quantum efficiency approaching 866%, a dark current in the picoamp range, and a fast response time of 87 μs, this atomic layer device exhibits multiple significant advances in overall performance for this class of devices.
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ISSN:1530-6984
1530-6992
1530-6992
DOI:10.1021/acs.nanolett.5b00016