AFM-Induced Amine Deprotection:  Triggering Localized Bond Cleavage by Application of Tip/Substrate Voltage Bias for the Surface Self-Assembly of Nanosized Dendritic Objects

An α,α-dimethyl-3,5-dimethoxybenzyloxycarbonyl (DDZ)-protected amine monolayer can be selectively deprotected by the application of a voltage bias from a conducting AFM tip to afford localized nanoscale patterns that can be visualized by self-assembly of dendritic molecular objects with terminal car...

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Bibliographic Details
Published inJournal of the American Chemical Society Vol. 126; no. 27; pp. 8374 - 8375
Main Authors Fresco, Zachary M, Suez, Itai, Backer, Scott A, Fréchet, Jean M. J
Format Journal Article
LanguageEnglish
Published WASHINGTON American Chemical Society 14.07.2004
Amer Chemical Soc
Subjects
Chemistry
Chemistry, Multidisciplinary
Exact sciences and technology
General and physical chemistry
General, apparatus
Physical Sciences
Science & Technology
Surface physical chemistry
INITIATED POLYMERIZATION
IRRADIATION
AMPLIFICATION
ELECTRON-BEAMS
PATTERNS
GENERATION
PROTECTING GROUPS
CHEMICAL NANOLITHOGRAPHY
MONOLAYERS
LITHOGRAPHY
Carboxylate polymer
Monolayer
Atomic force microscopy
Tip surface interaction
Chemical modification
Aliphatic compound
Molecular interaction
Experimental study
Primary amine
Dendritic structure
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Summary:An α,α-dimethyl-3,5-dimethoxybenzyloxycarbonyl (DDZ)-protected amine monolayer can be selectively deprotected by the application of a voltage bias from a conducting AFM tip to afford localized nanoscale patterns that can be visualized by self-assembly of dendritic molecular objects with terminal carboxylic acid groups and different aspect ratios.
Bibliography:ark:/67375/TPS-9H397S39-Z
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ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0002-7863
1520-5126
DOI:10.1021/ja047774q