Pesticide Residues in Heterogeneous Plant Populations, a Model-Based Approach Applied to Nematicides in Banana (Musa spp.)

Nematicides are widely used to control plant-parasitic nematodes in intensive export banana (Musa spp.) cropping systems. Data show that the concentration of fosthiazate in banana fruits varies from zero to 0.035 g kg-1, under the maximal residue limit (MRL = 0.05 mg kg-1). The fosthiazate concentra...

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Bibliographic Details
Published inJournal of agricultural and food chemistry Vol. 55; no. 6; pp. 2504 - 2508
Main Authors Tixier, Philippe, Chabrier, Christian, Malézieux, Eric
Format Journal Article
LanguageEnglish
Published Washington, DC American Chemical Society 21.03.2007
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Summary:Nematicides are widely used to control plant-parasitic nematodes in intensive export banana (Musa spp.) cropping systems. Data show that the concentration of fosthiazate in banana fruits varies from zero to 0.035 g kg-1, under the maximal residue limit (MRL = 0.05 mg kg-1). The fosthiazate concentration in fruit is described by a Gaussian envelope curve function of the interval between pesticide application and fruit harvest (preharvest interval). The heterogeneity of phenological stages in a banana population increases over time, and thus the preharvest interval of fruits harvested after a pesticide application varies over time. A phenological model was used to simulate the long-term harvest dynamics of banana at field scale. Simulations show that the mean fosthiazate concentration in fruits varies according to nematicide application program, climate (temperature), and planting date of the banana field. This method is used to assess the percentage of harvested bunches that exceed a residue threshold and to help farmers minimize fosthiazate residues in bananas. Keywords: Nematicide residues; fosthiazate; banana; Musa spp.; SIMBA; population model; preharvest interval; agricultural products safety; consumer exposure to pesticides
Bibliography:http://dx.doi.org/10.1021/jf062710f
istex:65B23A7E1B81CF41492ADED6B728E2D4A3FCC6E5
ark:/67375/TPS-G6LTXH5Z-X
ISSN:0021-8561
1520-5118
DOI:10.1021/jf062710f