Influence of pH on the Formation of Sulfate and Hydroxyl Radicals in the UV/Peroxymonosulfate System

• Published in: Environmental science & technology Vol. 45; no. 21; pp. 9308 - 9314
• Main Authors: Guan, Ying-Hong, Ma, Jun, Li, Xu-Chun, Fang, Jing-Yun, Chen, Li-Wei
• Format: Journal Article
• Language: English
• Published: Washington, DC American Chemical Society 01.11.2011
• Subjects: Applied sciences; Biodegradation; Chemical compounds; Exact sciences and technology; Global environmental pollution; Hydrogen-Ion Concentration; Hydroxyl Radical - chemistry; Hypotheses; Kinetics; Peroxides - chemistry; Pollution; Remediation and Control Technologies; Simulation; Sulfates - chemistry; Ultraviolet Rays; Benzoic acid; Pollutant behavior; Sulfates; Pollution; Ultraviolet radiation; Carboxylic acid; Hydroxyl radicals; pH; Environment; Aromatic compound; Organic compounds; Photochemical degradation; Inorganic radical anion

The influence of pH on the degradation of refractory organics (benzoic acid, BA) in UV(254 nm)/Peroxymonosulfate (UV/PMS) system was investigated. The degradation of BA was significantly enhanced at the pH range of 8–11, which could not be explained only by the generally accepted theory that SO4 •‑...