Robust Pattern Transfer of Nanoimprinted Features for Sub-5-nm Fabrication

• Published in: Nano letters Vol. 9; no. 10; pp. 3629 - 3634
• Main Authors: Schvartzman, Mark, Wind, Shalom J
• Format: Journal Article
• Language: English
• Published: Washington, DC American Chemical Society 01.10.2009
• Subjects: Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Materials science; Methods of nanofabrication; Physics; Annealing; Nanoimprint lithography; Aspect ratio; Nanomaterial synthesis; Resists; Nanoimprint

We explore the limits of a simple and facile process for transferring low aspect ratio, high-resolution features defined by nanoimprint lithography. The process involves postimprint deposition of an angle-evaporated hard mask. This widens the process window for residual resist removal and facilitate...