Kinetic modeling of the chemical vapor deposition of tin oxide from dimethyltin dichloride and oxygen

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Bibliographic Details
Published inJournal of physical chemistry (1952) Vol. 97; no. 10; pp. 2275 - 2283
Main Authors Giunta, Carmen J, Strickler, David A, Gordon, Roy G
Format Journal Article
LanguageEnglish
Published Washington, DC American Chemical Society 01.03.1993
Subjects
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of crystal growth; physics of crystal growth
Physics
Theory and models of crystal growth; physics of crystal growth, crystal morphology and orientation
Crystal growth
Chemical reaction
Tin IV Oxides
Theoretical study
Reaction mechanism
Kinetics
Thermodynamic properties
Chemical vapor deposition
Precursor
Inorganic compound
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Bibliography:ark:/67375/TPS-W5B52H16-1
istex:027211E41D6384120CFDD2ED68E843328558E8B7
ISSN:0022-3654
1541-5740
DOI:10.1021/j100112a032