Lasing from a Large-Area 2D Material Enabled by a Dual-Resonance Metasurface

Semiconducting transition metal dichalcogenides (TMDs) have gained significant attention as a gain medium for nanolasers, owing to their unique ability to be easily placed and stacked on virtually any substrate. However, the atomically thin nature of the active material in existing TMD lasers and th...

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Published inACS nano Vol. 18; no. 20; pp. 12897 - 12904
Main Authors Barth, Isabel, Deckart, Manuel, Conteduca, Donato, Arruda, Guilherme S., Hayran, Zeki, Pasko, Sergej, Krotkus, Simonas, Heuken, Michael, Monticone, Francesco, Krauss, Thomas F., Martins, Emiliano R., Wang, Yue
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 21.05.2024
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Summary:Semiconducting transition metal dichalcogenides (TMDs) have gained significant attention as a gain medium for nanolasers, owing to their unique ability to be easily placed and stacked on virtually any substrate. However, the atomically thin nature of the active material in existing TMD lasers and the limited size due to mechanical exfoliation presents a challenge, as their limited output power makes it difficult to distinguish between true laser operation and other “laser-like” phenomena. Here, we present room temperature lasing from a large-area tungsten disulfide (WS2) monolayer, grown by a wafer-scale chemical vapor deposition (CVD) technique. The monolayer is placed on a dual-resonance dielectric metasurface with a rectangular lattice designed to enhance both absorption and emission, resulting in an ultralow threshold operation (threshold well below 1 W/cm2). We provide a thorough study of the laser performance, paying special attention to directionality, output power, and spatial coherence. Notably, our lasers demonstrated a coherence length of over 30 μm, which is several times greater than what has been reported for 2D material lasers so far. Our realization of a single-mode laser from a CVD-grown monolayer presents exciting opportunities for integration and the development of real-world applications.
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ISSN:1936-0851
1936-086X
DOI:10.1021/acsnano.4c00547