Dominant Kinetic Pathways of Graphene Growth in Chemical Vapor Deposition: The Role of Hydrogen
The most popular way to produce graphene nowadays is chemical vapor deposition, where, surprisingly, H2 gas is routinely supplied even though it is a byproduct itself. In this study, by identifying dominant growing pathways via multiscale simulations, we unambiguously reveal the central role hydroge...
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Published in | Journal of physical chemistry. C Vol. 121; no. 46; pp. 25949 - 25955 |
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Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
American Chemical Society
22.11.2017
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Online Access | Get full text |
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Summary: | The most popular way to produce graphene nowadays is chemical vapor deposition, where, surprisingly, H2 gas is routinely supplied even though it is a byproduct itself. In this study, by identifying dominant growing pathways via multiscale simulations, we unambiguously reveal the central role hydrogen played in graphene growth. Hydrogen can saturate the edges of a growing graphene island to some extent, depending on the H2 pressure. Although graphene etching by hydrogen has been observed in experiment, hydrogen saturation actually stabilizes graphene edges by reducing the detachment rates of carbon-containing species. Such a new picture well explains some puzzling experimental observations and is also instrumental in growth protocol optimization for two-dimensional atomic crystal van der Waals epitaxy. |
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ISSN: | 1932-7447 1932-7455 |
DOI: | 10.1021/acs.jpcc.7b09622 |