Surface concentrations of indium, phosphorus and oxygen in indium phosphide single crystals after exposure to gamble solution

Indium phosphide is an important III-V semiconductor for the fabrication of a variety of semiconductor devices. A study of the surface of indium phosphide single crystals exposed to synthetic lung fluid is presented.

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Bibliographic Details
Published inAnalytical chemistry (Washington) Vol. 64; no. 23; pp. 2929 - 2933
Main Authors Dittmar, Tami B, Fernando, Quintus, Leavitt, J. A, McIntyre, L. C
Format Journal Article
LanguageEnglish
Published Washington, DC American Chemical Society 01.12.1992
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Summary:Indium phosphide is an important III-V semiconductor for the fabrication of a variety of semiconductor devices. A study of the surface of indium phosphide single crystals exposed to synthetic lung fluid is presented.
Bibliography:ark:/67375/TPS-2P45V5MD-L
istex:2FD784A488C3ED93F2EF5013BBF66F60EA672B11
ISSN:0003-2700
1520-6882
DOI:10.1021/ac00047a009