Surface concentrations of indium, phosphorus and oxygen in indium phosphide single crystals after exposure to gamble solution
Indium phosphide is an important III-V semiconductor for the fabrication of a variety of semiconductor devices. A study of the surface of indium phosphide single crystals exposed to synthetic lung fluid is presented.
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Published in | Analytical chemistry (Washington) Vol. 64; no. 23; pp. 2929 - 2933 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Washington, DC
American Chemical Society
01.12.1992
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Subjects | |
Online Access | Get full text |
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Summary: | Indium phosphide is an important III-V semiconductor for the fabrication of a variety of semiconductor devices. A study of the surface of indium phosphide single crystals exposed to synthetic lung fluid is presented. |
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Bibliography: | ark:/67375/TPS-2P45V5MD-L istex:2FD784A488C3ED93F2EF5013BBF66F60EA672B11 |
ISSN: | 0003-2700 1520-6882 |
DOI: | 10.1021/ac00047a009 |