New Algorithmic Techniques for Complex EDA Problems

[...]the sixth paper "Line search-based inverse lithography technique for mask design" by X. Zhao and C. Chu, presents a novel enhanced mask design method via a highly efficient gradient-basedsearch technique that results in fewer pattern errors than previous work;it thus also reduces vari...

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Bibliographic Details
Published inVLSI Design Vol. 2014; no. 2014; pp. 4 - 5
Main Authors Dutt, Shantanu, Mehta, Dinesh, Nam, Gi-Joon
Format Journal Article
LanguageEnglish
Published New York Hindawi Limiteds 01.01.2014
Hindawi Publishing Corporation
Hindawi Limited
Subjects
Algorithms
Computer engineering
Electronic design automation
Heuristic
Methods
Traveling salesman problem
Very large scale integration
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Summary:[...]the sixth paper "Line search-based inverse lithography technique for mask design" by X. Zhao and C. Chu, presents a novel enhanced mask design method via a highly efficient gradient-basedsearch technique that results in fewer pattern errors than previous work;it thus also reduces variability.
ISSN:1065-514X
1563-5171
DOI:10.1155/2014/134946