"Tailored" organometallics as precursors for the chemical vapor deposition of high-purity palladium and platinum thin films
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Published in | Journal of the American Chemical Society Vol. 110; no. 8; pp. 2688 - 2689 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Washington, DC
American Chemical Society
01.04.1988
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Subjects | |
Online Access | Get full text |
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Bibliography: | istex:CA23A8E5868E095CFB93B8E14377B5D23351066C ark:/67375/TPS-ZCWQ1WQB-G |
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ISSN: | 0002-7863 1520-5126 |
DOI: | 10.1021/ja00216a073 |