High Quantum Efficiency Nanopillar Photodiodes Overcoming the Diffraction Limit of Light

• Published in: Nano letters Vol. 16; no. 1; pp. 199 - 204
• Main Authors: Lee, Wook-Jae, Senanayake, Pradeep, Farrell, Alan C, Lin, Andrew, Hung, Chung-Hong, Huffaker, Diana L
• Format: Journal Article
• Language: English
• Published: United States American Chemical Society 13.01.2016
• Subjects: InAsSb; surface plasmons; Nanowires; nanopillar; diffraction limit; nanophotodiode
• ISSN: 1530-6984; 1530-6992
• DOI: 10.1021/acs.nanolett.5b03485

InAs1–x Sb x nanowires have recently attracted interest for infrared sensing applications due to the small bandgap and high thermal conductivity. However, previous reports on nanowire-based infrared sensors required low operating temperatures in order to mitigate the high dark current and have shown poor sensitivities resulting from reduced light coupling efficiency beyond the diffraction limit. Here, InAsSb nanopillar photodiodes with high quantum efficiency are achieved by partially coating the nanopillar with metal that excites localized surface plasmon resonances, leading to quantum efficiencies of ∼29% at 2390 nm. These high quantum efficiency nanopillar photodiodes, with 180 nm diameters and 1000 nm heights, allow operation at temperatures as high as 220 K and exhibit a detection wavelength up to 3000 nm, well beyond the diffraction limit. The InAsSb nanopillars are grown on low cost GaAs (111)B substrates using an InAs buffer layer, making our device architecture a promising path toward low-cost infrared focal plane arrays with high operating temperature.