Effect of Spatial Confinement on the Glass-Transition Temperature of Patterned Polymer Nanostructures

Poly(methyl methacrylate) (PMMA) nanostructures embedded with a fluorescence tag are fabricated using electron beam lithography on oxidized silicon substrates. The glass transition temperatures (T gs) of these one-dimensional (1-D) nanostructures (parallel lines) are measured by monitoring their tem...

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Bibliographic Details
Published inNano letters Vol. 7; no. 3; pp. 713 - 718
Main Authors Mundra, Manish K, Donthu, Suresh K, Dravid, Vinayak P, Torkelson, John M
Format Journal Article
LanguageEnglish
Published Washington, DC American Chemical Society 01.03.2007
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Summary:Poly(methyl methacrylate) (PMMA) nanostructures embedded with a fluorescence tag are fabricated using electron beam lithography on oxidized silicon substrates. The glass transition temperatures (T gs) of these one-dimensional (1-D) nanostructures (parallel lines) are measured by monitoring their temperature-dependent fluorescence intensities, revealing substantial differences between the T gs of the nanostructures and the thin films from which they were fabricated. For example, the T g of 50-nm-wide PMMA nanolines on silica is ∼15 K lower than that of a PMMA film on silica of the same 18 nm thickness. Attractive PMMA−silica interfacial interactions increase the T g, while free surfaces decrease the T g of PMMA in ultrathin films relative to bulk PMMA. Thus, the significant differences between the T gs of the 1-D and two-dimensional (2-D) forms of PMMA on silica are the result of a substantial increase in the ratio of free-surface area to interfacial area in the PMMA nanolines relative to ultrathin films.
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ISSN:1530-6984
1530-6992
DOI:10.1021/nl062894c