Effect of Spatial Confinement on the Glass-Transition Temperature of Patterned Polymer Nanostructures
Poly(methyl methacrylate) (PMMA) nanostructures embedded with a fluorescence tag are fabricated using electron beam lithography on oxidized silicon substrates. The glass transition temperatures (T gs) of these one-dimensional (1-D) nanostructures (parallel lines) are measured by monitoring their tem...
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Published in | Nano letters Vol. 7; no. 3; pp. 713 - 718 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
Washington, DC
American Chemical Society
01.03.2007
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Subjects | |
Online Access | Get full text |
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Summary: | Poly(methyl methacrylate) (PMMA) nanostructures embedded with a fluorescence tag are fabricated using electron beam lithography on oxidized silicon substrates. The glass transition temperatures (T gs) of these one-dimensional (1-D) nanostructures (parallel lines) are measured by monitoring their temperature-dependent fluorescence intensities, revealing substantial differences between the T gs of the nanostructures and the thin films from which they were fabricated. For example, the T g of 50-nm-wide PMMA nanolines on silica is ∼15 K lower than that of a PMMA film on silica of the same 18 nm thickness. Attractive PMMA−silica interfacial interactions increase the T g, while free surfaces decrease the T g of PMMA in ultrathin films relative to bulk PMMA. Thus, the significant differences between the T gs of the 1-D and two-dimensional (2-D) forms of PMMA on silica are the result of a substantial increase in the ratio of free-surface area to interfacial area in the PMMA nanolines relative to ultrathin films. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1530-6984 1530-6992 |
DOI: | 10.1021/nl062894c |