Nanolithography Using High Transmission Nanoscale Bowtie Apertures

We demonstrate that bowtie apertures can be used for contact lithography to achieve nanometer scale resolution. The bowtie apertures with a 30 nm gap size are fabricated in aluminum thin films coated on quartz substrates. Lithography results show that holes of sub-50-nm dimensions can be produced in...

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Bibliographic Details
Published inNano letters Vol. 6; no. 3; pp. 361 - 364
Main Authors Wang, Liang, Uppuluri, Sreemanth M, Jin, Eric X, Xu, Xianfan
Format Journal Article
LanguageEnglish
Published Washington, DC American Chemical Society 01.03.2006
Subjects
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Nanoscale materials and structures: fabrication and characterization
Other topics in nanoscale materials and structures
Physics
Lithography
Digital simulation
Light transmission
Nanostructures
Laser beams
Nanolithography
Aperture
Quartz
III-V compound
Thin films
Nanometer scale
Experimental result
Apertures
Photoresists
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Summary:We demonstrate that bowtie apertures can be used for contact lithography to achieve nanometer scale resolution. The bowtie apertures with a 30 nm gap size are fabricated in aluminum thin films coated on quartz substrates. Lithography results show that holes of sub-50-nm dimensions can be produced in photoresist by illuminating the apertures with a 355 nm laser beam polarized in the direction across the gap. Experimental results show enhanced transmission and light concentration of bowtie apertures compared to square and rectangular apertures of the same opening area. Finite different time domain simulations are used to explain the experimental results.
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ISSN:1530-6984
1530-6992
DOI:10.1021/nl052371p