Advances in Patterning Materials for 193 nm Immersion Lithography

Advances in 193 nm immersion lithography's patterning materials are discussed.

Saved in:
Bibliographic Details
Published inChemical reviews Vol. 110; no. 1; pp. 321 - 360
Main Author Sanders, Daniel P
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 13.01.2010
Subjects
Chemistry
Online AccessGet full text

Cover

More Information
Summary:Advances in 193 nm immersion lithography's patterning materials are discussed.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
ISSN:0009-2665
1520-6890
DOI:10.1021/cr900244n