Novel Photoresists Incorporating [(Trimethylsilyl)oxy]styrene

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Bibliographic Details
Published inChemistry of materials Vol. 6; no. 3; pp. 287 - 294
Main Authors Uhrich, K. E, Reichmanis, E, Heffner, S. A, Kometani, J. M, Nalamasu, O
Format Journal Article
LanguageEnglish
Published Washington, DC American Chemical Society 01.03.1994
Subjects
Applied sciences
Electrical, magnetic and optical properties
Exact sciences and technology
Organic polymers
Physicochemistry of polymers
Properties and characterization
Characterization
Preparation
Silylation
Photoresist
Styrene derivative polymer
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More Information
Bibliography:ark:/67375/TPS-L96V4HKN-X
istex:7CD2716203B9BA76DB6742503A7BFDD71858E0B9
ISSN:0897-4756
1520-5002
DOI:10.1021/cm00039a007