Low Temperature, Selective Atomic Layer Deposition of Nickel Metal Thin Films

• Published in: ACS applied materials & interfaces Vol. 10; no. 16; pp. 14200 - 14208
• Main Authors: Kerrigan, Marissa M, Klesko, Joseph P, Blakeney, Kyle J, Winter, Charles H
• Format: Journal Article
• Language: English
• Published: United States American Chemical Society 25.04.2018
• Subjects: nickel; atomic layer deposition; area-selective deposition; precursors; thin films
• ISSN: 1944-8244; 1944-8252
• DOI: 10.1021/acsami.8b03074

We report the growth of nickel metal films by atomic layer deposition (ALD) employing bis­(1,4-di-tert-butyl-1,3-diazadienyl)­nickel and tert-butylamine as the precursors. A range of metal and insulating substrates were explored. An initial deposition study was carried out on platinum substrates. Deposition temperatures ranged from 160 to 220 °C. Saturation plots demonstrated self-limited growth for both precursors, with a growth rate of 0.60 Å/cycle. A plot of growth rate versus substrate temperature showed an ALD window from 180 to 195 °C. Crystalline nickel metal was observed by X-ray diffraction for a 60 nm thick film deposited at 180 °C. Films with thicknesses of 18 and 60 nm grown at 180 °C showed low root mean square roughnesses (<2.5% of thicknesses) by atomic force microscopy. X-ray photoelectron spectroscopies of 18 and 60 nm thick films deposited on platinum at 180 °C revealed ionizations consistent with nickel metal after sputtering with argon ions. The nickel content in the films was >97%, with low levels of carbon, nitrogen, and oxygen. Films deposited on ruthenium substrates displayed lower growth rates than those observed on platinum substrates. On copper substrates, discontinuous island growth was observed at ≤1000 cycles. Film growth was not observed on insulating substrates under any conditions. The new nickel metal ALD procedure gives inherently selective deposition on ruthenium and platinum from 160 to 220 °C.