Realization of an Ideal Cairo Tessellation in Nickel Diazenide NiN2: High-Pressure Route to Pentagonal 2D Materials

Most of the studied two-dimensional (2D) materials are based on highly symmetric hexagonal structural motifs. In contrast, lower-symmetry structures may have exciting anisotropic properties leading to various applications in nanoelectronics. In this work we report the synthesis of nickel diazenide N...

Full description

Saved in:
Bibliographic Details
Published inACS nano Vol. 15; no. 8; pp. 13539 - 13546
Main Authors Bykov, Maxim, Bykova, Elena, Ponomareva, Alena V, Tasnádi, Ferenc, Chariton, Stella, Prakapenka, Vitali B, Glazyrin, Konstantin, Smith, Jesse S, Mahmood, Mohammad F, Abrikosov, Igor A, Goncharov, Alexander F
Format Journal Article
LanguageEnglish
Published United States American Chemical Society 24.08.2021
American Chemical Society (ACS)
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Most of the studied two-dimensional (2D) materials are based on highly symmetric hexagonal structural motifs. In contrast, lower-symmetry structures may have exciting anisotropic properties leading to various applications in nanoelectronics. In this work we report the synthesis of nickel diazenide NiN2 which possesses atomic-thick layers comprised of Ni2N3 pentagons forming Cairo-type tessellation. The layers of NiN2 are weakly bonded with the calculated exfoliation energy of 0.72 J/m2, which is just slightly larger than that of graphene. The compound crystallizes in the space group of the ideal Cairo tiling (P4/mbm) and possesses significant anisotropy of elastic properties. The single-layer NiN2 is a direct-band-gap semiconductor, while the bulk material is metallic. This indicates the promise of NiN2 to be a precursor of a pentagonal 2D material with a tunable direct band gap.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
AC02-06CH11357; FG02-94ER14466
USDOE Office of Science (SC)
National Science Foundation (NSF)
ISSN:1936-0851
1936-086X
1936-086X
DOI:10.1021/acsnano.1c04325