Self-Assembly Patterning of Silica Colloidal Crystals

We developed a self-assembly process of silica particles to fabricate desired patterns of colloidal crystals having high feature edge acuity and high regularity. A micropattern of colloidal methanol prepared on a self-assembled monolayer in hexane was used as a mold for particle patterning, and slow...

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Bibliographic Details
Published inLangmuir Vol. 21; no. 10; pp. 4478 - 4481
Main Authors Masuda, Yoshitake, Itoh, Tetsuya, Koumoto, Kunihito
Format Journal Article
LanguageEnglish
Published Washington, DC American Chemical Society 10.05.2005
Subjects
Chemistry
Exact sciences and technology
General and physical chemistry
Self assembly
Monolayer
Patterning
Device
Crystals
Alcohol
Shrinkage
Dissolution
Silica
Periodic structure
Particle
Generation
Alkanol
Hexane
Methanol
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Summary:We developed a self-assembly process of silica particles to fabricate desired patterns of colloidal crystals having high feature edge acuity and high regularity. A micropattern of colloidal methanol prepared on a self-assembled monolayer in hexane was used as a mold for particle patterning, and slow dissolution of methanol into hexane caused shrinkage of molds to form micropatterns of close-packed SiO2 particle assemblies. This result is a step toward the realization of nano/micro periodic structures for next-generation photonic devices by a self-assembly process.
Bibliography:istex:5F006BA95531258A9862322BE756B4B3826536D4
ark:/67375/TPS-TQ5QT653-7
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ISSN:0743-7463
1520-5827
DOI:10.1021/la050075m