Van der Waals Epitaxy and Photoresponse of Hexagonal Tellurium Nanoplates on Flexible Mica Sheets

• Published in: ACS nano Vol. 8; no. 7; pp. 7497 - 7505
• Main Authors: Wang, Qisheng, Safdar, Muhammad, Xu, Kai, Mirza, Misbah, Wang, Zhenxing, He, Jun
• Format: Journal Article
• Language: English
• Published: United States American Chemical Society 22.07.2014
• Subjects: 2D tellurium nanoplate; flexible device; van der Waals epitaxy; photodetector; mica substrate
• ISSN: 1936-0851; 1936-086X
• DOI: 10.1021/nn5028104

Van der Waals epitaxy (vdWE) is of great interest due to its extensive applications in the synthesis of ultrathin two-dimensional (2D) layered materials. However, vdWE of nonlayered functional materials is still not very well documented. Here, although tellurium has a strong tendency to grow into one-dimensional nanoarchitecture due to its chain-like structure, we successfully realize 2D hexagonal tellurium nanoplates on flexible mica sheets via vdWE. Chemically inert mica surface is found to be crucial for the lateral growth of hexagonal tellurium nanoplates since it (1) facilitates the migration of tellurium adatoms along mica surface and (2) allows a large lattice mismatch. Furthermore, 2D tellurium hexagonal nanoplates-based photodetectors are in situ fabricated on flexible mica sheets. Efficient photoresponse is obtained even after bending the device for 100 times, indicating 2D tellurium hexagonal nanoplates-based photodetectors on mica sheets have a great application potential in flexible and wearable optoelectronic devices. We believe the fundamental understanding of vdWE effect on the growth of 2D tellurium hexagonal nanoplate can pave the way toward leveraging vdWE as a useful channel to realize the 2D geometry of other nonlayered materials.