Surface Passivation of Efficient Nanotextured Black Silicon Solar Cells Using Thermal Atomic Layer Deposition

• Published in: ACS applied materials & interfaces Vol. 5; no. 19; pp. 9752 - 9759
• Main Authors: Wang, Wei-Cheng, Lin, Che-Wei, Chen, Hsin-Jui, Chang, Che-Wei, Huang, Jhih-Jie, Yang, Ming-Jui, Tjahjono, Budi, Huang, Jian-Jia, Hsu, Wen-Ching, Chen, Miin-Jang
• Format: Journal Article
• Language: English
• Published: United States American Chemical Society 09.10.2013
• Subjects: aluminum oxide (Al2O3); silicon nanowire; surface passivation; atomic layer deposition; nanotextured black silicon; solar cell
• ISSN: 1944-8244; 1944-8252
• DOI: 10.1021/am402889k

Efficient nanotextured black silicon solar cells passivated by an Al2O3 layer are demonstrated. The broadband antireflection of the nanotextured black silicon solar cells was provided by fabricating vertically aligned silicon nanowire (SiNW) arrays on the n + emitter. A highly conformal Al2O3 layer was deposited upon the SiNW arrays by the thermal atomic layer deposition (ALD) based on the multiple pulses scheme. The nanotextured black silicon wafer covered with the Al2O3 layer exhibited a low total reflectance of ∼1.5% in a broad spectrum from 400 to 800 nm. The Al2O3 passivation layer also contributes to the suppressed surface recombination, which was explored in terms of the chemical and field-effect passivation effects. An 8% increment of short-circuit current density and 10.3% enhancement of efficiency were achieved due to the ALD Al2O3 surface passivation and forming gas annealing. A high efficiency up to 18.2% was realized in the ALD Al2O3-passivated nanotextured black silicon solar cells.