Template-Assisted Patterning of Nanoscale Self-assembled Monolayer Arrays on Surfaces
We report a general, simple, and inexpensive approach to pattern features of self-assembled monolayers (SAMs) on silicon and gold surfaces using porous anodic alumina films as templates. The SAM patterns, with feature sizes down to 30 nm and densities higher than 1010/cm2, can be prepared over large...
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Published in | Langmuir Vol. 22; no. 19; pp. 8078 - 8082 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Washington, DC
American Chemical Society
12.09.2006
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Subjects | |
Online Access | Get full text |
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Summary: | We report a general, simple, and inexpensive approach to pattern features of self-assembled monolayers (SAMs) on silicon and gold surfaces using porous anodic alumina films as templates. The SAM patterns, with feature sizes down to 30 nm and densities higher than 1010/cm2, can be prepared over large areas (>5 cm2). The feature dimensions can be tuned by controlling the alumina template structure. These SAM patterns have been successfully used as resists for fabricating gold and silicon nanoparticle arrays on substrates by wet-chemical etching. In addition, we show that arrays of gold features can be patterned with 10-nm gaps between the dots. |
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Bibliography: | ark:/67375/TPS-PRCVGRV8-H istex:16E819314899D3A45EB7B834F79EF69E8321223A ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 0743-7463 1520-5827 |
DOI: | 10.1021/la060658b |