Template-Assisted Patterning of Nanoscale Self-assembled Monolayer Arrays on Surfaces

We report a general, simple, and inexpensive approach to pattern features of self-assembled monolayers (SAMs) on silicon and gold surfaces using porous anodic alumina films as templates. The SAM patterns, with feature sizes down to 30 nm and densities higher than 1010/cm2, can be prepared over large...

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Bibliographic Details
Published inLangmuir Vol. 22; no. 19; pp. 8078 - 8082
Main Authors Gao, Han, Gosvami, Nitya N, Deng, Jie, Tan, Le-Shon, Sander, Melissa S
Format Journal Article
LanguageEnglish
Published Washington, DC American Chemical Society 12.09.2006
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Summary:We report a general, simple, and inexpensive approach to pattern features of self-assembled monolayers (SAMs) on silicon and gold surfaces using porous anodic alumina films as templates. The SAM patterns, with feature sizes down to 30 nm and densities higher than 1010/cm2, can be prepared over large areas (>5 cm2). The feature dimensions can be tuned by controlling the alumina template structure. These SAM patterns have been successfully used as resists for fabricating gold and silicon nanoparticle arrays on substrates by wet-chemical etching. In addition, we show that arrays of gold features can be patterned with 10-nm gaps between the dots.
Bibliography:ark:/67375/TPS-PRCVGRV8-H
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ISSN:0743-7463
1520-5827
DOI:10.1021/la060658b