Electric Bistability Induced by Incorporating Self-Assembled Monolayers/aggregated Clusters of Azobenzene Derivatives in Pentacene-Based Thin-Film Transistors
Composite films of pentacene and a series of azobenzene derivatives are prepared and used as the active channel material in top-contact, bottom-gate field-effect transistors. The transistors exhibit high field-effect mobility as well as large I–V hysteresis as a function of the gate bias history. Th...
Saved in:
Published in | ACS applied materials & interfaces Vol. 4; no. 10; pp. 5483 - 5491 |
---|---|
Main Authors | , , |
Format | Journal Article |
Language | English |
Published |
United States
American Chemical Society
24.10.2012
|
Subjects | |
Online Access | Get full text |
Cover
Loading…
Summary: | Composite films of pentacene and a series of azobenzene derivatives are prepared and used as the active channel material in top-contact, bottom-gate field-effect transistors. The transistors exhibit high field-effect mobility as well as large I–V hysteresis as a function of the gate bias history. The azobenzene moieties, incorporated either in the form of self-assembled monolayer or discrete multilayer clusters at the dielectric surface, result in electric bistability of the pentacene-based transistor either by photoexcitation or gate biasing. The direction of threshold voltage shifts, size of hysteresis, response time, and retention characteristics all strongly depend on the substituent on the benzene ring. The results show that introducing a monolayer of azobenzene moieties results in formation of charge carrier traps responsible for slower switching between the bistable states and longer retention time. With clusters of azobenzene moieties as the trap sites, the switching is faster but the retention is shorter. Detailed film structure analyses and correlation with the transistor/memory properties of these devices are provided. |
---|---|
Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1944-8244 1944-8252 |
DOI: | 10.1021/am3013906 |