Molecular Sensing Using Monolayer Floating Gate, Fully Depleted SOI MOSFET Acting as an Exponential Transducer
Field-effect transistor-based chemical sensors fall into two broad categories based on the principle of signal transductionchemiresistor or Schottky-type devices and MOSFET or inversion-type devices. In this paper, we report a new inversion-type device conceptfully depleted exponentially coupled (...
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Published in | ACS nano Vol. 4; no. 2; pp. 999 - 1011 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
United States
American Chemical Society
23.02.2010
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Subjects | |
Online Access | Get full text |
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Summary: | Field-effect transistor-based chemical sensors fall into two broad categories based on the principle of signal transductionchemiresistor or Schottky-type devices and MOSFET or inversion-type devices. In this paper, we report a new inversion-type device conceptfully depleted exponentially coupled (FDEC) sensor, using molecular monolayer floating gate fully depleted silicon on insulator (SOI) MOSFET. Molecular binding at the chemical-sensitive surface lowers the threshold voltage of the device inversion channel due to a unique capacitive charge-coupling mechanism involving interface defect states, causing an exponential increase in the inversion channel current. This response of the device is in opposite direction when compared to typical MOSFET-type sensors, wherein inversion current decreases in a conventional n-channel sensor device upon addition of negative charge to the chemical-sensitive device surface. The new sensor architecture enables ultrahigh sensitivity along with extraordinary selectivity. We propose the new sensor concept with the aid of analytical equations and present results from our experiments in liquid phase and gas phase to demonstrate the new principle of signal transduction. We present data from numerical simulations to further support our theory. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 1936-0851 1936-086X |
DOI: | 10.1021/nn900901f |