Thin Film Morphologies of Bulk-Gyroid Polystyrene-block-polydimethylsiloxane under Solvent Vapor Annealing

Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-b-PDMS) diblock copolymer subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but as a thin film the morphology can form spheres, cylinders, perforated lamellae, or...

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Bibliographic Details
Published inMacromolecules Vol. 47; no. 17; pp. 6000 - 6008
Main Authors Bai, Wubin, Hannon, Adam F, Gotrik, Kevin W, Choi, Hong Kyoon, Aissou, Karim, Liontos, George, Ntetsikas, Konstantinos, Alexander-Katz, Alfredo, Avgeropoulos, Apostolos, Ross, Caroline A
Format Journal Article
LanguageEnglish
Published American Chemical Society 09.09.2014
Subjects
annealing
Chemical Sciences
composite polymers
mathematical theory
Polymers
solvents
vapors
PHASE
MOLECULAR-WEIGHT
DIBLOCK COPOLYMER
ORIENTATION
POLY(DIMETHYLSILOXANE)
PATTERNS
DIMETHYLSILOXANE
TRANSITIONS
ARRAYS
LITHOGRAPHY
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Summary:Thin film morphologies of a 75.5 kg/mol polystyrene-block-polydimethylsiloxane (PS-b-PDMS) diblock copolymer subject to solvent vapor annealing are described. The PS-b-PDMS has a double-gyroid morphology in bulk, but as a thin film the morphology can form spheres, cylinders, perforated lamellae, or gyroids, depending on the film thickness, its commensurability with the microdomain period, and the ratio of toluene:heptane vapors used for the solvent annealing process. The morphologies are described by self-consistent field theory simulations. Thin film structures with excellent long-range order were produced, which are promising for nanopatterning applications.
Bibliography:ObjectType-Article-1
SourceType-Scholarly Journals-1
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content type line 23
ISSN:0024-9297
1520-5835
1520-5835
DOI:10.1021/ma501293n