Self-Controlled Growth of Silica Thin Films for Nanopatterning

We report a new method to control both the nucleation and growth of SiO2 to form nanopatterns width in an oil phase, using poly(styrene-b-4-vinylpyridine) (PS-b-4PV) as a template. The resulting SiO2 can be selectively grown on protonated 4VP blocks up to a height of 8 nm by 60 nm.

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Bibliographic Details
Published inLangmuir Vol. 18; no. 9; pp. 3430 - 3433
Main Authors Cho, Gyoujin, Jang, Jongkwan, Jung, Sunggi, Moon, Il-Shik, Lee, Jae-Suk, Cho, Young-Sun, Fung, Bing M, Yuan, Wei-Li, O'Rear, Edgar A
Format Journal Article
LanguageEnglish
Published American Chemical Society 30.04.2002
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Summary:We report a new method to control both the nucleation and growth of SiO2 to form nanopatterns width in an oil phase, using poly(styrene-b-4-vinylpyridine) (PS-b-4PV) as a template. The resulting SiO2 can be selectively grown on protonated 4VP blocks up to a height of 8 nm by 60 nm.
Bibliography:ark:/67375/TPS-2HLP329W-R
istex:2209816C60576FBE1F24BD7CE1ABDD4D945E9BE3
ISSN:0743-7463
1520-5827
DOI:10.1021/la015688n