Annealing-Induced Molecular Reorientation in Oligosilane Thin Films

• Published in: The journal of physical chemistry. B Vol. 105; no. 19; pp. 4118 - 4121
• Main Authors: Ichino, Yoshiro, Minami, Nobutsugu
• Format: Journal Article
• Language: English
• Published: American Chemical Society 17.05.2001
• ISSN: 1520-6106; 1520-5207
• DOI: 10.1021/jp003544w

Annealing effects on molecular orientation and multilayer order in vacuum-deposited permethyldecasilane thin films were investigated by means of X-ray diffractometry (XRD) and UV absorption spectroscopy. An annealing-induced multilayered structure with the molecular orientation oblique to the substrate was observed by XRD. Strong incident-angle dependence of the absorption spectrum of the as-deposited film was mainly due to a spectral component attributed to a molecular orientation normal to the substrate. After annealing, the absorption spectrum and its incident-angle dependence significantly changed, which is explained in terms of molecular reorientation. Detailed spectral analysis to assign each component to specific molecular orientation is presented.