(Trimethoxysilyl)carbene:  Photochemistry, Oxidation, and Carbonylation of a Silylcarbene

Photolysis (λ > 345 nm) of matrix-isolated (trimethoxysilyl)diazomethane (1e) leads to the formation of (trimethoxysilyl)carbene (2e), which was characterized by IR and UV−vis spectroscopy. The photochemistry, reaction with molecular oxygen, and carbonylation of 2e were studied in argon matrices...

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Bibliographic Details
Published inOrganometallics Vol. 15; no. 2; pp. 736 - 740
Main Authors Trommer, Martin, Sander, Wolfram
Format Journal Article
LanguageEnglish
Published WASHINGTON American Chemical Society 23.01.1996
Amer Chemical Soc
Subjects
Chemistry
Chemistry, Inorganic & Nuclear
Chemistry, Organic
Physical Sciences
Science & Technology
OXYGEN
SILAACRYLATE
CHEMISTRY
OXIDES
SILENE
MATRIX-ISOLATION
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Summary:Photolysis (λ > 345 nm) of matrix-isolated (trimethoxysilyl)diazomethane (1e) leads to the formation of (trimethoxysilyl)carbene (2e), which was characterized by IR and UV−vis spectroscopy. The photochemistry, reaction with molecular oxygen, and carbonylation of 2e were studied in argon matrices at cryogenic temperatures. These experiments demonstrate that 2e is a triplet ground state carbene. Photolysis at 280 nm results in the formation of 1,1-dimethoxy-1,2-silaoxetane by insertion of the carbene center into one of the adjacent methyl groups.
Bibliography:istex:ECAEAFA1A6239FA08FD56E286520B0EC1120BC2F
Abstract published in Advance ACS Abstracts, December 15, 1995.
ark:/67375/TPS-ZJN9J2WQ-3
ISSN:0276-7333
1520-6041
DOI:10.1021/om950782i